DETERMINATION OF GAIN AND LOSS MECHANISMS IN SEMICONDUCTOR-LASERS USING PRESSURE TECHNIQUES

Citation
Ep. Oreilly et al., DETERMINATION OF GAIN AND LOSS MECHANISMS IN SEMICONDUCTOR-LASERS USING PRESSURE TECHNIQUES, Physica status solidi. b, Basic research, 198(1), 1996, pp. 363-373
Citations number
13
Categorie Soggetti
Physics, Condensed Matter
ISSN journal
03701972
Volume
198
Issue
1
Year of publication
1996
Pages
363 - 373
Database
ISI
SICI code
0370-1972(1996)198:1<363:DOGALM>2.0.ZU;2-B
Abstract
Both the gain and loss mechanisms in semiconductor lasers are determin ed in large part by the band structure of the laser active region and tile surrounding material layers. Uniaxial stress measurements confirm the predicted variation of gain and threshold characteristics due to the incorporation of axial strain; mitl-l large tensile or compressive strain reducing tile carrier and current density required to reach th reshold. The combination of hydrostatic pressure measurements and band structure calculations enables identification of the dominant loss me chanisms in semiconductor lasers; identifying leakage from the active to the cladding region as the dominant loss mechanism in GaInP/AlGaInP visible lasers: and Auger recombination as the dominant loss mechanis m and cause of the temperature sensitivity of long wavelength (1.3 to 1.55 mu m) lasers.