Pk. Nair et al., FORMATION OF P-TYPE CU3BIS3 ABSORBER THIN-FILMS BY ANNEALING CHEMICALLY DEPOSITED BI2S3-CUS THIN-FILMS, Journal of materials research, 12(3), 1997, pp. 651-656
Formation of the ternary compound Cu3BiS3 during annealing of chemical
ly deposited CuS (similar to 0.3 mu m) films on Bi2S3 film (similar to
0.1 mu m on glass substrate) is reported. The interfacial atomic diff
usion leading to the formation of the compound during the annealing is
indicated in x-ray photoelectron depth profile spectra of the films.
The formation of Cu3BiS3 (Wittichenite, JCPDS 9-488) is confirmed by t
he x-ray diffraction (XRD) patterns. The films are optically absorbing
in the entire visible region (absorption coefficient 4 x 10(4) cm(-1)
at 2.48 eV or 0.50 mu m) and are p-type with electrical conductivity
of 10(2)-10(3) Omega(-1) cm(-1). Potential applications of these films
as optical coatings in the control of solar energy transmittance thro
ugh glazings and as a p-type absorber film in solar cell structures ar
e indicated.