LARGE POSITIVE MAGNETORESISTANCE IN CR AG/CR TRILAYERS/

Citation
G. Verbanck et al., LARGE POSITIVE MAGNETORESISTANCE IN CR AG/CR TRILAYERS/, Applied physics letters, 70(11), 1997, pp. 1477-1479
Citations number
9
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00036951
Volume
70
Issue
11
Year of publication
1997
Pages
1477 - 1479
Database
ISI
SICI code
0003-6951(1997)70:11<1477:LPMICA>2.0.ZU;2-C
Abstract
Large positive magnetoresistance (LPMR) effects have been measured at temperatures T < 100 K in epitaxial Cr/Ag/Cr trilayers grown by molecu lar beam epitaxy. Compared to single Ag films, the magnetoresistance a t 4.2 K is enhanced by nearly two orders of magnitude reaching values up to 120% in a field of 8 Tesla. This behavior is related to a drasti c modification of the electron scattering at the Ag interfaces due to the presence of the buffer and cap Cr layers. The LPMR curves measured at different temperatures demonstrate a scaling behavior typical for electron transport in two-dimensional systems. The magnitude of the LP MR is a function of temperature and residual resistance ratio and is i nfluenced by the direction of the applied magnetic field. (C) 1997 Ame rican Institute of Physics.