Focused ion beam direct deposition has been developed as a new techniq
ue for making patterned metal film directly on substrates. The 20 keV
Au+ ion beam is focused, deflected, and finally decelerated to 30-200
eV between the objective lens and substrate. The decelerated beam is d
eposited on the substrate at room temperature. The beam diameter can b
e tuned between 0.5 and 8 mum and the beam current varies from 40 pA t
o 10 nA, corresponding to the beam diameter. Current density was about
20 mA/cm2, so that the deposition rate in the beam spot was estimated
about 0.02 mum/s. The purity of gold film was measured with Auger ele
ctron spectroscopy and contents of carbon and oxygen, undesirable impu
rities, were below detection limits. The resistivity was constant at 3
.7 +/- 0.1 muOMEGA cm for deposition over the ion energy range of 34-1
94 eV.