The mode of operation of metal-insulator-semiconductor (MIS) hydrogen
sensors, which contain Langmuir-Blodgett solid ultrathin films as the
insulator layer, has been examined. The device response to low concent
rations (0-6 ppm) of hydrogen in nitrogen at 373 K was observed to cor
relate with analyte concentration according to the Lundstrom model, wh
ile at lower temperatures or in the presence of air, no such correlati
on was evident. Results from transient response and operating stabilit
y tests, taken together with previously reported analyses using X-ray
photoelectron spectroscopy, indicate significant differences, compared
with conventional (oxide I-layer) MIS devices, in the mechanism of in
teraction of hydrogen with the sensor. The palladium M-layer in the pr
esent device does not appear to be porous, according to carbon monoxid
e interference tests and it is proposed that there is no significant p
ermeation of oxygen through the device.