MICROANALYSIS OF MATERIALS BY PIXE USING FOCUSED MEV HEAVY-ION BEAMS

Citation
Y. Horino et al., MICROANALYSIS OF MATERIALS BY PIXE USING FOCUSED MEV HEAVY-ION BEAMS, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 75(1-4), 1993, pp. 535-538
Citations number
8
Categorie Soggetti
Physics, Nuclear","Nuclear Sciences & Tecnology","Instument & Instrumentation
ISSN journal
0168583X
Volume
75
Issue
1-4
Year of publication
1993
Pages
535 - 538
Database
ISI
SICI code
0168-583X(1993)75:1-4<535:MOMBPU>2.0.ZU;2-H
Abstract
MeV heavy ion microprobes, 3 MeV C2+, Si2+ and Ni2+, were applied for micro-PIXE measurements. It was found that the X-ray yields vary drast ically as a function of the combination of the atomic number of incide nt ions and target atoms, which indicates that there is a best combina tion for specific element analysis. This was demonstrated by an invest igation of human nail by a silicon microprobe which was compared with the case of proton. Furthermore, the minimum detectable gold weights i n silicon were also estimated as a practical case and it was found tha t a carbon microprobe was best for measuring gold atoms in silicon.