G. Fragneto et al., NEUTRON REFLECTION FROM HEXADECYLTRIMETHYLAMMONIUM BROMIDE ADSORBED ON SMOOTH AND ROUGH SILICON SURFACES, Langmuir, 12(25), 1996, pp. 6036-6043
Neutron reflection has been used to investigate the structure of hexad
ecyltrimethylammonium bromide (C(16)TAB) layers adsorbed at the silico
n/silicon oxide/aqueous interface. Separate isotropic labeling of grou
ps of four methylene groups at a time made it possible to determine th
e structure of the layer at a higher resolution than previously possib
le. The structure of the layer was investigated on smooth and rough su
rfaces. The roughness of the surface has a significant effect on the p
roperties of the layer. On the rough surface the bilayer is shown to b
e thicker and to be unsymmetrical in the direction of the surface norm
al. The surface coverage was also found to be lower on the rough surfa
ce. As in previous studies the surface was found not to be completely
covered, lending support to the idea that adsorption is in the form of
aggregates. The division into smaller isotopically labeled fragments
shows, however, that the aggregates strongly resemble bilayer fragment
s, and their overall thickness, at 32 +/- 1 Angstrom, is substantially
less than the diameter of a micelle.