Partial octadecylsiloxane monolayers were formed on borosilicate glass
substrates and characterized using friction force microscopy (FFM) an
d contact angle techniques. Use of the friction force microscope allow
ed the film composition to be investigated despite significant roughne
ss of the underlying substrate. The height variations of the substrate
were of the same order as the film thickness: a situation in which co
nventional atomic force microscopy can produce ambiguous or inconclusi
ve results. Substrates with a range of partial surface coverages were
prepared, and contact angle measurements demonstrated the expected dec
rease in wettability with increasing siloxane coverage. Friction force
microscopy revealed a corresponding decrease in the friction coeffici
ent of the surface with increasing coverage. Microscope resolution det
ermined an upper limit of 15 nm for the lateral size of isolated silox
ane domains for all coverages.