GROWN-IN POINT-DEFECTS IN VAPOR-PHASE EPITAXIAL GAAS0.6P0.4-TE

Authors
Citation
P. Kaminski, GROWN-IN POINT-DEFECTS IN VAPOR-PHASE EPITAXIAL GAAS0.6P0.4-TE, Semiconductor science and technology, 8(4), 1993, pp. 538-543
Citations number
18
Categorie Soggetti
Engineering, Eletrical & Electronic","Physics, Condensed Matter","Material Science
ISSN journal
02681242
Volume
8
Issue
4
Year of publication
1993
Pages
538 - 543
Database
ISI
SICI code
0268-1242(1993)8:4<538:GPIVEG>2.0.ZU;2-F
Abstract
Deep-level transient spectroscopy (DLTS) has been employed to study gr own-in point defects in vapour phase epitaxial layers of GaAs0.6P0.4: Te. It was found that for the Ga-rich vapour phase three electron trap s T1 (0.20 eV), T2 (0.18 eV) and T3 (0.38 eV) are formed. The traps T1 and T2 were found to be donor-related and are tentatively identified as Te(As)GA(As)Te(As) and O(i)Te(As) complexes, respectively. The trap T3 was found to be dependent on the dislocation density and it is pos sibly associated with either an As or P vacancy generated by the incre ase in misfit dislocations. A detrimental effect of these defects on t he radiative recombination efficiency is shown. Under an excess of the group V elements in the vapour phase, only one electron trap T4 (0.18 eV) was observed.