The electrical properties of sol-gel prepared aluminosilicate films we
re investigated for suitability in electronic applications. The alumin
osilicate films exhibited apparent closed porosity and a dielectric co
nstant as low as almost-equal-to 5 with processing temperatures from 3
73 K to 873 K. The porosity was inaccessible to nitrogen at 77 K, heli
um at 293 K, and water vapor at 293 K. Both bulk and thin-film samples
were analyzed for hydroxyl and carbon contents to elucidate the relat
ive dependence of the measured electrical proper-ties on processing co
nditions. Experiments indicate it is possible to vary the porosity in
bulk material in ways that should improve electrical properties.