KINETICS OF THE SIH3+O2 AND SIH3+NO2 REACTIONS

Authors
QUANDT RW HERSHBERGER JF
Citation
Rw. Quandt et Jf. Hershberger, KINETICS OF THE SIH3+O2 AND SIH3+NO2 REACTIONS, Chemical physics letters, 206(1-4), 1993, pp. 355-360
Citations number
26
Categorie Soggetti
Physics, Atomic, Molecular & Chemical
Journal title
Chemical physics letters → ACNP
ISSN journal
00092614
Volume
206
Issue
1-4
Year of publication
1993
Pages
355 - 360
Database
ISI
SICI code
0009-2614(1993)206:1-4<355:KOTSAS>2.0.ZU;2-L
Abstract
The reactions SiH3+O2 and SiH3+NO2 were studied over the temperature r ange 235-512 K using time-resolved infrared diode laser absorption spe ctroscopy. Observed rate constants are k(SiH3+O2)=(2.07+/-0.34)x10(-12 )exp[(469+/-60)/T] and k(SiH3+NO2)= (2.25+/-0.48)x10(-11)exp[(264+/-80 )/T] cm3 molecule-1 s-1. These results are consistent with initial SiH 3O2 and SiH3NO2 adduct formation followed by possible rearrangement an d subsequent dissociation.