DEPOSITION ERROR COMPENSATION FOR OPTICAL MULTILAYER COATINGS .2. EXPERIMENTAL RESULTS - SPUTTERING SYSTEM

Citation
Bt. Sullivan et Ja. Dobrowolski, DEPOSITION ERROR COMPENSATION FOR OPTICAL MULTILAYER COATINGS .2. EXPERIMENTAL RESULTS - SPUTTERING SYSTEM, Applied optics, 32(13), 1993, pp. 2351-2360
Citations number
10
Categorie Soggetti
Optics
Journal title
ISSN journal
00036935
Volume
32
Issue
13
Year of publication
1993
Pages
2351 - 2360
Database
ISI
SICI code
0003-6935(1993)32:13<2351:DECFOM>2.0.ZU;2-F
Abstract
A fully automated magnetron-sputtering system for the deposition of co mplicated optical multilayer structures is described. The process cont rol includes the real-time determination of the deposited layer thickn esses and adjustment of the remaining layer thicknesses to reoptimize the final performance of the multilayer system. With this deposition s ystem it should be possible to produce almost any all-dielectric filte r that can be designed, subject only to limitations imposed by time, c ost, and mechanical stability of the coatings. To demonstrate the perf ormance of the deposition system, five complex multilayer systems were fabricated. The theoretical and measured spectral transmittance curve s of these multilayer systems closely agree with one another over broa d spectral regions. The equipment is capable of unattended operation o ver periods of 24 h or more.