A fully automated magnetron-sputtering system for the deposition of co
mplicated optical multilayer structures is described. The process cont
rol includes the real-time determination of the deposited layer thickn
esses and adjustment of the remaining layer thicknesses to reoptimize
the final performance of the multilayer system. With this deposition s
ystem it should be possible to produce almost any all-dielectric filte
r that can be designed, subject only to limitations imposed by time, c
ost, and mechanical stability of the coatings. To demonstrate the perf
ormance of the deposition system, five complex multilayer systems were
fabricated. The theoretical and measured spectral transmittance curve
s of these multilayer systems closely agree with one another over broa
d spectral regions. The equipment is capable of unattended operation o
ver periods of 24 h or more.