FIELD-EMISSION FROM SILICON THROUGH STABLE CONTAMINANT LAYERS

Citation
J. Liu et al., FIELD-EMISSION FROM SILICON THROUGH STABLE CONTAMINANT LAYERS, Applied surface science, 67(1-4), 1993, pp. 48-55
Citations number
17
Categorie Soggetti
Physics, Condensed Matter","Chemistry Physical
Journal title
ISSN journal
01694332
Volume
67
Issue
1-4
Year of publication
1993
Pages
48 - 55
Database
ISI
SICI code
0169-4332(1993)67:1-4<48:FFSTSC>2.0.ZU;2-4
Abstract
Silicon field emitter arrays have been studied by field emission curre nt-voltage measurements as well as by direct FEM and FIM imaging. A ty pical stable current of 1 muA per emitter was measured at extraction v oltages of about 150 V. The data yielded a linear Fowler-Nordheim plot ; however, an irreversible and abrupt change of slope was observed in the early stage of field emission upon the first increase in field. Su bsequently stable and reversible, but displaced, F-N plots were obtain ed. We postulate that this phenomenon is due to a self-regulating proc ess that forms a thin stable contaminant on the emitting surface. This hypothesis was tested under controlled conditions using single emitte rs and found to be self-consistent.