ATOM-PROBE ANALYSIS OF SPUTTERED CO-CR MAGNETIC THIN-FILMS

Citation
K. Hono et al., ATOM-PROBE ANALYSIS OF SPUTTERED CO-CR MAGNETIC THIN-FILMS, Applied surface science, 67(1-4), 1993, pp. 386-390
Citations number
19
Categorie Soggetti
Physics, Condensed Matter","Chemistry Physical
Journal title
ISSN journal
01694332
Volume
67
Issue
1-4
Year of publication
1993
Pages
386 - 390
Database
ISI
SICI code
0169-4332(1993)67:1-4<386:AAOSCM>2.0.ZU;2-4
Abstract
Both Co-22at%Cr bulk alloy and its thin films were analyzed by an atom probe field ion microscope. While no compositional inhomogeneity was found in the bulk sample, a significant compositional fluctuation was found in the Co-Cr thin film sample which was deposited on a tungsten tip surface at 200-degrees-C. The concentration of the Cr enriched reg ion was in the range of 30-40 at% Cr, while that of the Cr depleted re gion was in the range of 5-10 at% Cr.