K. Hono et al., ATOM-PROBE ANALYSIS OF A NANOCRYSTALLINE FE-C-TA SPUTTERED SOFT MAGNETIC THIN-FILM, Applied surface science, 67(1-4), 1993, pp. 391-397
Sputtered Fe-10.3at%C-8.3at%Ta magnetic thin films annealed below 650-
degrees-C were analyzed by the atom probe method in order to elucidate
the mechanism of formation of the nanocrystalline structure. In the a
s-deposited amorphous film, evidence for significant variation of the
carbon concentration was found. By annealing below the crystallization
temperature, the degree of fluctuation of the carbon concentration ap
peared to be enhanced. After heat treatment for optimum soft magnetic
properties, TaC was observed. In this condition, substantial amounts o
f supersaturated C and Ta were still dissolved in the alpha-Fe phase.