APPLICATION OF MEV HEAVY-ION MICROPROBES FOR PIXE MEASUREMENTS

MeV heavy ion microprobes, 3 MeV C2+, Si2+ and Ni2+ Were applied for m icro-PIXE measurements for aluminium, silicon, copper, silver and gold substrates. To compare with the case of light ions, a 2 MeV H+ microb eam was also employed. It was found that the X-ray yields vary drastic ally as a function of the combination of the atomic number of incident ions and target atoms. This indicates that there is an optimum combin ation for specific element analysis. The minimum detectable gold weigh ts in silicon were also estimated for a practical case and it was foun d that a r-arbon beam was best for measuring gold atoms in silicon.