NONDESTRUCTIVE EVALUATION OF SOLIDS AND DEPOSITED FILMS BY THERMAL-WAVE INTERFEROMETRY

Citation
E. Oesterschulze et al., NONDESTRUCTIVE EVALUATION OF SOLIDS AND DEPOSITED FILMS BY THERMAL-WAVE INTERFEROMETRY, Applied surface science, 69(1-4), 1993, pp. 65-68
Citations number
6
Categorie Soggetti
Physics, Condensed Matter","Chemistry Physical
Journal title
ISSN journal
01694332
Volume
69
Issue
1-4
Year of publication
1993
Pages
65 - 68
Database
ISI
SICI code
0169-4332(1993)69:1-4<65:NEOSAD>2.0.ZU;2-C
Abstract
In order to investigate heat diffusion processes in dielectric or meta llic materials, a differential interferometer was constructed allowing phase-sensitive measurement of the thermal expansion of periodically excited solid surfaces. To get insight into the physical process of he at propagation, a three-dimensional model of temperature diffusion wil l be introduced. This theoretical model may be considered as a first s tep for the understanding of signal formation in case of investigating the homogeneity or adhesion properties of deposited films by means of thermal-wave interferometry. First measurements will be presented and thermal parameters evaluated using the model mentioned above.