PULSED-LASER DEPOSITION - A VERSATILE TECHNIQUE ONLY FOR HIGH-TEMPERATURE SUPERCONDUCTOR THIN-FILM DEPOSITION

Authors
Citation
Hu. Habermeier, PULSED-LASER DEPOSITION - A VERSATILE TECHNIQUE ONLY FOR HIGH-TEMPERATURE SUPERCONDUCTOR THIN-FILM DEPOSITION, Applied surface science, 69(1-4), 1993, pp. 204-211
Citations number
24
Categorie Soggetti
Physics, Condensed Matter","Chemistry Physical
Journal title
ISSN journal
01694332
Volume
69
Issue
1-4
Year of publication
1993
Pages
204 - 211
Database
ISI
SICI code
0169-4332(1993)69:1-4<204:PD-AVT>2.0.ZU;2-7
Abstract
One of the most stringent prerequisites for the successful deposition of high-temperature superconductor (HTS) thin films of high quality is the stoichiometry control. This prerequisite will be met easily using the pulsed laser deposition technique (PLD) by the nature of the proc ess. This paper highlights the principles of the preparation of Y-base d and Bi-based HTS thin films by PID, giving some emphasis to the stud y of the in-plane epitaxy of c-axis oriented films by X-ray techniques and Raman scattering. In particular, new results will be reviewed con cerning the fabrication and properties of Pr-substituted Y-Ba-Cu-O thi n films and Pr-Ba-Cu-O/Y-Ba-Cu-O superlattices with different periodic ity. Focussing on the more methodological aspects of these efforts, so me possibilities will be explored to prepare new complex materials of technological interest with the pulsed laser deposition technique.