HETEROEPITAXIAL OXIDIC CONDUCTOR LA1-XSRXCOO3 PREPARED BY PULSED-LASER DEPOSITION

Citation
Jfm. Cillessen et al., HETEROEPITAXIAL OXIDIC CONDUCTOR LA1-XSRXCOO3 PREPARED BY PULSED-LASER DEPOSITION, Applied surface science, 69(1-4), 1993, pp. 212-215
Citations number
7
Categorie Soggetti
Physics, Condensed Matter","Chemistry Physical
Journal title
ISSN journal
01694332
Volume
69
Issue
1-4
Year of publication
1993
Pages
212 - 215
Database
ISI
SICI code
0169-4332(1993)69:1-4<212:HOCLPB>2.0.ZU;2-W
Abstract
La1-xSrxCoO3 films have been grown highly textured on Si/SiO2(100) and epitaxially on MgO(100) substrates, despite the large lattice mismatc h. This is confirmed by XRD pole figures and HR-TEM analyses: misfit c orrections are observed in the first atomic layers. Electrical and str uctural analyses are discussed and show that La1-xSrxCoO3 is a promisi ng electrode material, providing a thermally stable and electrically i ntimate contact with oxidic active layers. Dielectric and ferro-electr ic materials sandwiched between these oxidic electrodes showed sharp i nterfaces and excellent electrical properties.