LASER DIRECT WRITING OF TITANIUM SILICIDE THIN-FILMS

Authors
REISSE G GANSICKE F FISCHER A JOHANSEN H
Citation
G. Reisse et al., LASER DIRECT WRITING OF TITANIUM SILICIDE THIN-FILMS, Applied surface science, 69(1-4), 1993, pp. 412-417
Citations number
4
Categorie Soggetti
Physics, Condensed Matter","Chemistry Physical
Journal title
Applied surface science → ACNP
ISSN journal
01694332
Volume
69
Issue
1-4
Year of publication
1993
Pages
412 - 417
Database
ISI
SICI code
0169-4332(1993)69:1-4<412:LDWOTS>2.0.ZU;2-C
Abstract
Investigations concerning the laser-induced chemical vapour deposition of TiSi2 thin films from SiH4 and TiCl4 using a direct writing method are presented. A CO2-laser at lambda = 10.6 mum and an argon ion lase r in the VIS (488-527 nm, multiline mode) were used for the preferably thermal deposition on SiO2 and c-Si substrates. The influence of the deposition parameters gas composition, laser power, scan velocity and laser wavelength on structural, geometric, and electrical properties i s reported.