By. Tang et al., MEASUREMENT OF ION SPECIES RATIO IN THE PLASMA SOURCE ION-IMPLANTATION PROCESS, Journal of applied physics, 73(9), 1993, pp. 4176-4180
Ion species and their ratios in nitrogen, oxygen, and argon plasmas in
the plasma source ion implantation process have been determined with
a simple and low-cost measurement system. The measured ion species rat
io in the nitrogen plasma was used as an input parameter for the compu
ter simulation code transport and mixing from ion irradiation to predi
ct the atomic composition-depth profile. Comparison between the code r
esults and data derived from Auger analysis for a nitrogen-implanted T
i-6Al-4V alloy showed good agreement. In this article, the design, per
formance, and possible future improvements regarding the resolution of
this measurement system will be discussed.