TRANSMISSION ELECTRON-MICROSCOPY AND SCANNING-TRANSMISSION ELECTRON-MICROSCOPE ANALYSIS OF THE EFFECTS OF THERMAL-PROCESSING ON THE STRUCTURAL INTEGRITY OF GAINAS GAINASP MULTILAYERS/
Re. Mallard et al., TRANSMISSION ELECTRON-MICROSCOPY AND SCANNING-TRANSMISSION ELECTRON-MICROSCOPE ANALYSIS OF THE EFFECTS OF THERMAL-PROCESSING ON THE STRUCTURAL INTEGRITY OF GAINAS GAINASP MULTILAYERS/, Journal of applied physics, 73(9), 1993, pp. 4297-4304
The structural characterization by electron microscopy of a metalorgan
ic chemical vapor deposition grown GaInAs/GaInAsP multiple-quantum-wel
l structure undergoing a ''blue shift'' in luminescence wavelength upo
n thermal processing, as part of a multistage epitaxial growth process
, is reported. The sample exhibits a shift toward shorter wavelengths
of greater than 100 nm upon annealing at 750-degrees-C. The structural
modifications that result in the blue shift include an elimination of
atomic ordering in the quaternary barrier layers of the material, and
significant layer interdiffusion. A method is described whereby quant
itative analyses of the layer composition and lattice parameter with a
spatial resolution better than 2 nm can be obtained from semiconducto
r multilayers using energy-dispersive x-ray microanalysis in the scann
ing transmission electron microscope. Such an analysis shows that the
interdiffusion occurs along a nonlinear (that is, nonlattice matched)
path where the group-V element diffusivities exceed those of the group
-III elements, and results in the incorporation of excess coherency st
rains of up to 0.5% in the quantum-well regions.