THE INFLUENCE OF ELECTRODEPOSITED GOLD ON THE PROPERTIES OF III-V SEMICONDUCTOR ELECTRODES .3. RESULTS ON N-GAAS PROVIDED WITH THICK GOLD LAYERS

Citation
G. Oskam et al., THE INFLUENCE OF ELECTRODEPOSITED GOLD ON THE PROPERTIES OF III-V SEMICONDUCTOR ELECTRODES .3. RESULTS ON N-GAAS PROVIDED WITH THICK GOLD LAYERS, Electrochimica acta, 38(8), 1993, pp. 1115-1121
Citations number
7
Categorie Soggetti
Electrochemistry
Journal title
ISSN journal
00134686
Volume
38
Issue
8
Year of publication
1993
Pages
1115 - 1121
Database
ISI
SICI code
0013-4686(1993)38:8<1115:TIOEGO>2.0.ZU;2-0
Abstract
The influence of electrodeposited gold on the current-potential and im pedance characteristics of n-GaAs electrodes was studied in various el ectrolyte solutions. The potential of the gold layer on n-GaAs was mea sured as a function of the bias applied to the electrode. It is conclu ded that the same processes occur as previously proposed for gold-plat ed p-GaAs electrodes. A model involving gold-related surface states wh ich interact with both the valence band and the electrolyte solution w as used to explain the results for p-GaAs. For n-GaAs, an additional p rocess is found to play an important role recombination of thermally p roduced holes with conduction band electrons.