EFFECT OF LA3-OXIDE( IONS ON THE DEPOSITION OF NICKEL)

Authors
MATSUMOTO Y SASAKI T HOMBO J
Citation
Y. Matsumoto et al., EFFECT OF LA3-OXIDE( IONS ON THE DEPOSITION OF NICKEL), Electrochimica acta, 38(8), 1993, pp. 1145-1146
Citations number
9
Categorie Soggetti
Electrochemistry
Journal title
Electrochimica acta → ACNP
ISSN journal
00134686
Volume
38
Issue
8
Year of publication
1993
Pages
1145 - 1146
Database
ISI
SICI code
0013-4686(1993)38:8<1145:EOLIOT>2.0.ZU;2-U
Abstract
The effect of La3+ ions on the deposition of nickel oxide (NiOOH) in s olutions containing both La3+ and Ni2+ ions was studied. La3+ ions sup pressed a growth of NiOOH by their incorporation into the deposit in t he deposition process. The rate of La3+ incorporation is low, compared with that of the NiOOH deposition. The limiting value in the atomic r atio of La/Ni in the deposit was about 1-2 when NiOOH was deposited un der a low deposition rate.