EPITAXIAL-GROWTH OF POLY(DIMETHYLSILANE) EVAPORATED-FILMS ON POLY(TETRAFLUOROETHYLENE) LAYER

Citation
R. Hattori et al., EPITAXIAL-GROWTH OF POLY(DIMETHYLSILANE) EVAPORATED-FILMS ON POLY(TETRAFLUOROETHYLENE) LAYER, JPN J A P 1, 36(2), 1997, pp. 819-823
Citations number
12
Categorie Soggetti
Physics, Applied
Volume
36
Issue
2
Year of publication
1997
Pages
819 - 823
Database
ISI
SICI code
Abstract
Epitaxially grown poly(dimethylsilane) (PDMS) films have been prepared by evaporation on a highly-oriented poly(tetrafluoroethylene) (PTFE) layer which is formed by means of a mechanical deposition technique. T he orientation characteristics of PDMS films are determined using atom ic force microscopy, polarizing microscope images, X-ray diffraction p atterns and polarized absorption spectra. The oriented regions lie alo ng the grooves (1-5 mu m wide) formed on the PTFE layer. The X-ray dif fraction patterns and the polarized absorption spectra indicate that t he (110) plane of the crystal structure is parallel to the substrate s urface and that the c-axis of the Si-backbone chain is parallel to the grooves on the PTFE-coated Substrate.