GROWTH AND MAGNETIC STUDIES OF EPITAXIAL-FILMS OF FE, CO AND NI ON CU(100) SI(100)/

We have studied the growth of single-crystal films of fcc Cu(100) on f reshly HF-etched Si(100) substrates at room temperature in a MBE depos ition system. Using Cu(100) as a seed layer we have grown Fe, Co and N i in the thickness range of 10-500 angstrom. X-ray diffraction, reflec tion high-energy electron diffraction (RHEED) and ferromagnetic resona nce (FMR) measurements confirm the epitaxial growth of Ni and Co on Cu (100) with a fcc(100) structure whereas Fe grows with bcc(110) Pitsch orientation relationships.