MAGNETORESISTANCE IN FCC (100) CO CU MULTILAYERS - MODELING WITH CU SPATIAL THICKNESS FLUCTUATIONS/

The magnetic properties of fcc (100) Co/Cu multilayers epitaxially gro wn on Cu/Si(100) substrates have been investigated by means of magneto metry and magnetoresistance measurements. The magnetoresistance oscill ates as a function of the Cu thickness with a period of about 10 angst rom and the first maximum (7%) is reached for 21 angstrom. Cubic in-pl ane anisotropy and oscillatory interlayer couplings are detected. In o rder to model the magnetization behaviour, we have derived a model whi ch includes thickness fluctuations in the Cu layers. It introduces an effective distribution of the interlayer coupling. From model hysteres is loops and magnetoresistance curves, the magnitudes of the effective coupling, of the thickness fluctuations and of the cubic in-plane ani sotropy have been derived.