The structure of condensed films of CO2-Xe is studied in a temperature
range of 6 to 60 K. The gas mixtures the composition of which varies
between 0 and 100% Xe are deposited at substrate temperatures of 55 an
d 6 K. it is found that under high-temperature deposition, up to 5 mol
. % Xe dissolves in the CO2 matrix while the dissolution Of CO2 in Xe
is beyond the electron diffraction technique sensitivity. The structur
e and the substructure of the low-temperature condensates and the kine
tic of relaxation processes induced by annealing of the films are cons
idered.