BINARY-MASK GENERATION FOR DIFFRACTIVE OPTICAL-ELEMENTS USING MICROCOMPUTERS

Citation
Dc. Oshea et al., BINARY-MASK GENERATION FOR DIFFRACTIVE OPTICAL-ELEMENTS USING MICROCOMPUTERS, Applied optics, 32(14), 1993, pp. 2566-2572
Citations number
14
Categorie Soggetti
Optics
Journal title
ISSN journal
00036935
Volume
32
Issue
14
Year of publication
1993
Pages
2566 - 2572
Database
ISI
SICI code
0003-6935(1993)32:14<2566:BGFDOU>2.0.ZU;2-E
Abstract
A new technique for generation of binary masks for the fabrication of diffractive optical elements is investigated. This technique, which us es commercially available desktop-publishing hardware and software in conjunction with a standard photoreduction camera, is much faster and less expensive than the conventional methods. The short turnaround tim e and low cost should give researchers a much greater degree of flexib ility in the field of binary optics and enable wider application of di ffractive-optics technology. Techniques for generating optical element s by using standard software packages that produce PostScript output a re described. An evaluation of the dimensional fidelity of the mask re production from design to its realization in photoresist is presented.