FAST-NEUTRON IRRADIATION FOR FABRICATION OF NARROW FORWARD VOLTAGE P-I-N-DIODES

Citation
Pk. Bhatnagar et al., FAST-NEUTRON IRRADIATION FOR FABRICATION OF NARROW FORWARD VOLTAGE P-I-N-DIODES, Nuclear instruments & methods in physics research. Section A, Accelerators, spectrometers, detectors and associated equipment, 329(3), 1993, pp. 467-469
Citations number
7
Categorie Soggetti
Nuclear Sciences & Tecnology","Physics, Particles & Fields","Instument & Instrumentation",Spectroscopy
ISSN journal
01689002
Volume
329
Issue
3
Year of publication
1993
Pages
467 - 469
Database
ISI
SICI code
0168-9002(1993)329:3<467:FIFFON>2.0.ZU;2-7
Abstract
Wide base p-i-n diodes show an increase in the forward voltage V(f) at a constant current when exposed to neutrons. The change in V(f) is a measure of neutron dose. Variation in V(f) with neutron dose is linear but has different slopes for regions below 2.5 Gy and above it. In or der to use a single electronic reader instrument for measuring a chang e in V(f), there is a requirement of fabricating diodes of unique V(f) , which is not always possible due to minor deviation in the quality o f wafer used. A method of exposing diodes to neutrons has been used to arrive at desired narrow V(f) for the p-i-n diodes produced in differ ent batches. Further the raw p-i-n diodes when exposed to about 2.5 Gy neutrons, before using them for dosimetry, need a readout instrument for simple amplification as the neutron response of the diodes give on ly one slope beyond 2.5 Gy.