SIMPLE, EXTREMELY LOW RESISTANCE CONTACT SYSTEM TO N-INP THAT DOES NOT EXHIBIT METAL-SEMICONDUCTOR INTERMIXING DURING SINTERING

Citation
Vg. Weizer et Ns. Fatemi, SIMPLE, EXTREMELY LOW RESISTANCE CONTACT SYSTEM TO N-INP THAT DOES NOT EXHIBIT METAL-SEMICONDUCTOR INTERMIXING DURING SINTERING, Applied physics letters, 62(21), 1993, pp. 2731-2733
Citations number
19
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00036951
Volume
62
Issue
21
Year of publication
1993
Pages
2731 - 2733
Database
ISI
SICI code
0003-6951(1993)62:21<2731:SELRCS>2.0.ZU;2-J
Abstract
Contact formation to InP is plagued by the violent metal-semiconductor intermixing that takes place during the contact sintering process. We have discovered a truly unique contact system, involving Au and Ge, w hich is easily fabricated, which exhibits extremely low values of cont act resistivity, and in which there is virtually no metal-semiconducto r interdiffusion, even after extended sintering. We present a descript ion of this contact system and suggest possible mechanisms to explain the observed behavior.