Vg. Weizer et Ns. Fatemi, SIMPLE, EXTREMELY LOW RESISTANCE CONTACT SYSTEM TO N-INP THAT DOES NOT EXHIBIT METAL-SEMICONDUCTOR INTERMIXING DURING SINTERING, Applied physics letters, 62(21), 1993, pp. 2731-2733
Contact formation to InP is plagued by the violent metal-semiconductor
intermixing that takes place during the contact sintering process. We
have discovered a truly unique contact system, involving Au and Ge, w
hich is easily fabricated, which exhibits extremely low values of cont
act resistivity, and in which there is virtually no metal-semiconducto
r interdiffusion, even after extended sintering. We present a descript
ion of this contact system and suggest possible mechanisms to explain
the observed behavior.