The adsorption of ethylene oxide on Ni(110) has been studied by TPD, w
ork function measurements, LEED, XPS, and angle resolved UPS using lin
early polarized synchrotron radiation. At temperatures below 100 K eth
ylene oxide adsorbs in molecular form on Ni(110) with a saturation cov
erage of approximately 0.5 ML (1 ML = 1 molecule/Ni atom). Upon heatin
g, molecular desorption occurs in a broad peak ranging from approximat
ely 110 to 240 K; there is no indication of dissociation, as concluded
from TPD and XPS. At saturation a sharp c(2 x 2) LEED pattern is obse
rved. From ARUPS we deduce that the C2 rotation axis of the molecule i
s tilted away from the surface normal and that the mirror planes of th
e molecule do not coincide with the substrate mirror planes, independe
nt of coverage.