OPTIMIZATION OF THE ANISOTROPY OF COMPOSITE MOS2 FILMS

MoS2 ''spread'' films are prepared by exfoliating MoS2 powder to singl e layers in suspension, then restacking t se single layers as an orien ted film. The anisotropy of spread MoS2 films has been optimized by pr eparing a composite with metal ions added to the edge sites and/or ins ulating polymer inserted between the planes of the MoS2 single layers which comprise the films. The ratio between the resistivities perpendi cular (rho(perpendicular-to)) and parallel (rho(parallel-to)) to the l ayer basal planes has been increased to at least 10(6) from a factor o f 10(2) for pure MoS2 spread films by varying these additives. A model for the conduction mechanism in such films is proposed.