GROWTH OF LARGE-AREA YBA2CU3O7-X FILMS BY ACTIVATED REACTIVE EVAPORATION

Citation
S. Prakash et al., GROWTH OF LARGE-AREA YBA2CU3O7-X FILMS BY ACTIVATED REACTIVE EVAPORATION, Thin solid films, 227(1), 1993, pp. 95-99
Citations number
14
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
ISSN journal
00406090
Volume
227
Issue
1
Year of publication
1993
Pages
95 - 99
Database
ISI
SICI code
0040-6090(1993)227:1<95:GOLYFB>2.0.ZU;2-D
Abstract
High-T(c) superconductor thin films have many important properties for microwave frequency passive device applications. However, for device fabrication it is necessary to deposit uniform defect-free films of YB a2Cu3O7-x (YBCO) over large wafer-size areas. The activated reactive e vaporation process has been used successfully to grow YBCO films at re latively low temperatures over large areas. The unique features of the process will be discussed over other popular processes with emphasis on film composition, structure and thickness uniformity,