High-T(c) superconductor thin films have many important properties for
microwave frequency passive device applications. However, for device
fabrication it is necessary to deposit uniform defect-free films of YB
a2Cu3O7-x (YBCO) over large wafer-size areas. The activated reactive e
vaporation process has been used successfully to grow YBCO films at re
latively low temperatures over large areas. The unique features of the
process will be discussed over other popular processes with emphasis
on film composition, structure and thickness uniformity,