METHOD FOR SPUTTER RATE DETERMINATION IN SPUTTER DEPTH PROFILING

Authors
LOPEZ F GARCIACUENCA MV ASENSI JM MORENZA JL
Citation
F. Lopez et al., METHOD FOR SPUTTER RATE DETERMINATION IN SPUTTER DEPTH PROFILING, Applied surface science, 70-1, 1993, pp. 68-72
Citations number
5
Categorie Soggetti
Physics, Condensed Matter","Chemistry Physical
Journal title
Applied surface science → ACNP
ISSN journal
01694332
Volume
70-1
Year of publication
1993
Part
A
Pages
68 - 72
Database
ISI
SICI code
0169-4332(1993)70-1:<68:MFSRDI>2.0.ZU;2-0
Abstract
Depth calibration in sputter depth profiling may be seriously in error in the analysis of inhomogeneous samples in which the erosion rate va ries. In this work, we present a practical method to evaluate the sput ter rate as a function of depth, requiring only routine instrumentatio n. Illustrative results in two inhomogeneous samples are presented.