COMPARISON OF INSITU LOW-PRESSURE OXIDATION OF PURE IRON AT ROOM-TEMPERATURE IN O2 AND IN O2 H2O MIXTURES USING XPS/

Citation
V. Stambouli et al., COMPARISON OF INSITU LOW-PRESSURE OXIDATION OF PURE IRON AT ROOM-TEMPERATURE IN O2 AND IN O2 H2O MIXTURES USING XPS/, Applied surface science, 70-1, 1993, pp. 240-244
Citations number
21
Categorie Soggetti
Physics, Condensed Matter","Chemistry Physical
Journal title
ISSN journal
01694332
Volume
70-1
Year of publication
1993
Part
A
Pages
240 - 244
Database
ISI
SICI code
0169-4332(1993)70-1:<240:COILOO>2.0.ZU;2-M
Abstract
Low-pressure (10(-6)-10(-8) Torr) in-situ oxidation of Fe by 02 and 02 plus H2O at room temperature has been studied by X-ray photoelectron spectroscopy. Non-linear least-squares fitting routines are applied to determine the thin oxide film composition. For exposures from 1 to 10 (4) L pure iron oxidation leads to a Fe2O3 layer on top of FeO. No or little FeOOH formation is observed. Some OH- is adsorbed at the surfac e. Exposure to a mixture of H2O + 02 (50/50) does not influence the co mposition of the oxide film.