SILICON MICROMACHINING TECHNOLOGY FOR SUBNANOGRAM DISCRETE MASS RESONANT BIOSENSORS

Citation
S. Prescesky et al., SILICON MICROMACHINING TECHNOLOGY FOR SUBNANOGRAM DISCRETE MASS RESONANT BIOSENSORS, Canadian journal of physics, 70(10-11), 1992, pp. 1178-1183
Citations number
10
Categorie Soggetti
Physics
Journal title
ISSN journal
00084204
Volume
70
Issue
10-11
Year of publication
1992
Pages
1178 - 1183
Database
ISI
SICI code
0008-4204(1992)70:10-11<1178:SMTFSD>2.0.ZU;2-9
Abstract
This paper describes a novel sub-nanogram discrete mass sensor with po ssible biological applications including potential biomass monitoring of living cells in culture. The sensing element is a micromachined sil icon dioxide cantilever fabricated using a process compatible with com mercial CMOS microelectronic processes. The 1 mum thick silicon dioxid e device consists of two 8 x 150 mum cantilever arms supporting a 50 x 50 mum payload platform. Actuation of this first generation device is performed using a small vibration table. Resonant amplitude are measu red by detecting the angular shift of a laser beam incident on the dev ice. Finite element analysis is used to model resonant frequencies. mo de shapes, and frequency response. Cantilever resonates in fundamental mode at 15.9 kHz and have an experimental mass sensitivity of 1.9 kHz ng-1.