PHOTOTHERMAL RATE-WINDOW SPECTROMETRY FOR NONCONTACT BULK LIFETIME MEASUREMENTS IN SEMICONDUCTORS

Citation
Zh. Chen et al., PHOTOTHERMAL RATE-WINDOW SPECTROMETRY FOR NONCONTACT BULK LIFETIME MEASUREMENTS IN SEMICONDUCTORS, Journal of applied physics, 73(10), 1993, pp. 5043-5048
Citations number
25
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00218979
Volume
73
Issue
10
Year of publication
1993
Part
1
Pages
5043 - 5048
Database
ISI
SICI code
0021-8979(1993)73:10<5043:PRSFNB>2.0.ZU;2-T
Abstract
A new noncontact technique for the determination of excess carrier lif etimes in semiconductors is presented. The technique employs a square laser pulse (hv > E(g)) and measures the infrared photothermal radiome tric response of the sample. By applying the photothermal rate-window concept, the excess photoexcited carrier bulk lifetime was measured wi th optimal signal-to-noise (S/N) ratio and simple, unambiguous interpr etation from the maximum position of the rate-window signal. The techn ique has been applied to Au-, Fe-, and Cr-doped Czochralski silicon cr ystals. The experimental results from boxcar and lock-in rate-window m ethods were found to agree very well. The results are further mostly i n agreement with those from the noncontact laser/microwave detection m ethod.