AN INSITU TRANSMISSION ELECTRON-MICROSCOPY STUDY OF ELECTRON-BEAM-INDUCED AMORPHOUS-TO-CRYSTALLINE TRANSFORMATION OF AL2O3 FILMS ON SILICON

Authors
LIU J BARBERO CJ CORBETT JW RAJAN K LEARY H
Citation
J. Liu et al., AN INSITU TRANSMISSION ELECTRON-MICROSCOPY STUDY OF ELECTRON-BEAM-INDUCED AMORPHOUS-TO-CRYSTALLINE TRANSFORMATION OF AL2O3 FILMS ON SILICON, Journal of applied physics, 73(10), 1993, pp. 5272-5273
Citations number
13
Categorie Soggetti
Physics, Applied
Journal title
Journal of applied physics → ACNP
ISSN journal
00218979
Volume
73
Issue
10
Year of publication
1993
Part
1
Pages
5272 - 5273
Database
ISI
SICI code
0021-8979(1993)73:10<5272:AITESO>2.0.ZU;2-J
Abstract
An in situ transmission electron microscopy study of the amorphous-to- crystalline transformation of Al2O3 films on a silicon substrate has b een carried out. It is found that a critical electron-beam dose rate i s required for the transformation to be observed. The possible effect of the silicon substrate on the growth of the Al2O3 crystallites is al so discussed.