QUASIDIFFUSION AND THE LOCALIZED PHONON SOURCE IN PHOTOEXCITED SI

Citation
Me. Msall et al., QUASIDIFFUSION AND THE LOCALIZED PHONON SOURCE IN PHOTOEXCITED SI, Physical review letters, 70(22), 1993, pp. 3463-3466
Citations number
15
Categorie Soggetti
Physics
Journal title
ISSN journal
00319007
Volume
70
Issue
22
Year of publication
1993
Pages
3463 - 3466
Database
ISI
SICI code
0031-9007(1993)70:22<3463:QATLPS>2.0.ZU;2-R
Abstract
Previous observations of heat pulses produced by localized photoexcita tion of silicon do not support the predictions of phonon ''quasidiffus ion'' via anharmonic decay and elastic scattering. Our experiments, wi th controlled boundary conditions, verify that quasidiffusive theory i s relevant in Si under very weak photoexcitation. Beyond this domain a transition to a localized source of low frequency phonons is attribut ed to excited carrier interactions. Photoluminescence experiments conf irm the presence of electron-hole droplets coincident with this locali zed phonon source.