FLUX-FLOW RESISTIVITY AND VORTEX VISCOSITY OF HIGH-T-C FILMS NEAR T-C

Authors
MARTIN JI VELEZ M GUINEA F VICENT JL
Citation
Ji. Martin et al., FLUX-FLOW RESISTIVITY AND VORTEX VISCOSITY OF HIGH-T-C FILMS NEAR T-C, Physical review. B, Condensed matter, 55(9), 1997, pp. 5659-5662
Citations number
15
Categorie Soggetti
Physics, Condensed Matter
Journal title
Physical review. B, Condensed matter → ACNP
ISSN journal
01631829
Volume
55
Issue
9
Year of publication
1997
Pages
5659 - 5662
Database
ISI
SICI code
0163-1829(1997)55:9<5659:FRAVVO>2.0.ZU;2-S
Abstract
The flux-flow regime of high-T-c samples of different normal-state res istivities is studied in the temperature range where the sign of the H all effect is reversed. The scaling of the vortex viscosity with norma l-state resistivity is consistent with the Bardeen-Stephen theory. Est imates of the influence of possible mechanisms suggested for the sign reversal of the Hall effect an also given.