STARK-LEVEL ONE-PHONON DEPHASING PROCESS OF ND3-DOPED SILICATE GLASS-FIBER STUDIED WITH ACCUMULATED PHOTON-ECHOES()

Authors
Citation
R. Yano et N. Uesugi, STARK-LEVEL ONE-PHONON DEPHASING PROCESS OF ND3-DOPED SILICATE GLASS-FIBER STUDIED WITH ACCUMULATED PHOTON-ECHOES(), Physical review. B, Condensed matter, 55(9), 1997, pp. 5712-5716
Citations number
22
Categorie Soggetti
Physics, Condensed Matter
ISSN journal
01631829
Volume
55
Issue
9
Year of publication
1997
Pages
5712 - 5716
Database
ISI
SICI code
0163-1829(1997)55:9<5712:SODPON>2.0.ZU;2-U
Abstract
Measurements of the homogeneous width of the (4)G(5/2), (2)G(7/2)-I-4( 9/2) transition of Nd3+ in a silicate glass fiber at low temperatures by the technique of accumulated photon echoes show that the dephasing processes are one-phonon processes between the Stark levels of Nd3+. T hese dephasing processes differ from the commonly observed processes o f rare-earth ion-doped glasses: the local-configurational-change-induc ed dephasing process and the Raman process with low-frequency modes. T he densely distributed Stark levels of the (4)G(5/2) and (2)G(7/2) sta tes are responsible for one-phonon processes. The transition-wavelengt h dependences of the homogeneous widths Gamma(h)(4.2 K) and Gamma(h)(T --> 0) ale explained by using the one-phonon process model.