G. Meunier et al., SYNTHESIS AND CHARACTERIZATION OF TITANIUM HYDRIDE THIN-FILMS OBTAINED BY REACTIVE CATHODIC SPUTTERING, Materials science & engineering. B, Solid-state materials for advanced technology, 18(3), 1993, pp. 303-307
Thin films of titanium hydride were obtained by reactive cathodic sput
tering with a titanium target using different compositions of a mixtur
e of hydrogen and argon as sputtering gas. The layered material is qui
te different from the bulk material: only a poorly crystallized phase
with formula TiH1.7 was synthesized at room temperature for all the ga
s mixtures investigated. The density measured by Rutherford backscatte
ring spectrometry and X-ray absorption is slightly lower than that of
the bulk hydride. These titanium hydride films can be used as a bindin
g compound in metal-ceramic brazing.