LARGE ACTIVATION OF PRASEODYMIUM IN IN0.53GA0.47AS

Citation
J. Novak et al., LARGE ACTIVATION OF PRASEODYMIUM IN IN0.53GA0.47AS, Semiconductor science and technology, 8(5), 1993, pp. 747-749
Citations number
8
Categorie Soggetti
Engineering, Eletrical & Electronic","Physics, Condensed Matter","Material Science
ISSN journal
02681242
Volume
8
Issue
5
Year of publication
1993
Pages
747 - 749
Database
ISI
SICI code
0268-1242(1993)8:5<747:LAOPII>2.0.ZU;2-F
Abstract
The electrical properties of Pr-doped In0.53Ga0.47As LPE epitaxial lay ers have been studied. Layers prepared by adding a small amount of PrO 2 to the melt are n-type and they are insensitive to the temperature t reatment. p-type epitaxial layers were grown when more than 1 mg of Pr O2 per 1 g of In was added to the melt. Annealing at a temperature of 400-degrees-C results in drastic changes of the electrical parameters and influences the photoluminescent spectra of p-layers. Praseodymium can be activated in a thin near-surface layer independently of the pro tective gas or metal covering. Additional annealing of the activated l ayers at higher temperatures has no further influence on the parameter s. After removing the thin surface layer by chemical etching the previ ous electrical parameters can be obtained.