MEASUREMENT OF THE EFFECTIVE WAVELENGTH OF X-RAY-LITHOGRAPHY SOURCES

Authors
MALDONADO JR BABICH I DIMILIA V
Citation
Jr. Maldonado et al., MEASUREMENT OF THE EFFECTIVE WAVELENGTH OF X-RAY-LITHOGRAPHY SOURCES, Microelectronic engineering, 21(1-4), 1993, pp. 113-116
Citations number
NO
Categorie Soggetti
Optics,"Physics, Applied","Engineering, Eletrical & Electronic
Journal title
Microelectronic engineering → ACNP
ISSN journal
01679317
Volume
21
Issue
1-4
Year of publication
1993
Pages
113 - 116
Database
ISI
SICI code
0167-9317(1993)21:1-4<113:MOTEWO>2.0.ZU;2-Y
Abstract
This paper describes techniques to determine the effective wavelength of x-ray lithography sources. The experimental results give informatio n on the actual x-ray absorption of the resist materials for the x-ray source under test. Results for two beam lines of the HELIOS storage r ing installed at the IBM Advanced Lithography Facility, and for one be am line at the VUV ring at the Brookhaven National Laboratory are pres ented, and compared to calculations.