GALVANOSTATIC PULSE AND PULSE REVERSE PLATING OF NICKEL-IRON ALLOYS FROM ELECTROLYTES CONTAINING ORGANIC-COMPOUNDS ON A ROTATING-DISK ELECTRODE

Linear sweep voltammetry, galvanostatic pulse, and pulse reverse techn iques were used to study the plating of nickel-iron alloys in the pres ence of organic additives. The effects of pulse current densities, i(p ), reverse current densities, i(r), rotation speed of disk electrode, and the presence of organic additives on deposition of nickel-iron all oys are evaluated. The observed phenomena can be explained by the conc entration depletion of reactants (or products), and the surface covera ge of the additives on the electrode. A new formulation of the plating bath is defined.