Epitaxial YBa2Cu3O7-delta films were grown on GaAs substrates using an
intermediate MgO buffer layer. It turned out that the basic requireme
nts in coping with GaAs related problems such as chemical instability
and volatility are lowest possible deposition temperatures and proper
encapsulation of bare GaAs faces, respectively. Applying our coevapora
tion technique we were able to achieve YBa2Cu3O7-delta films on GaAs w
hich can compete with those on standard substrates (T(c) = 87 K, rho(1
00K) = 40muOMEGAcm, j(c) = 2 . 10(6) A/cm2 at 77 K).