D. Ishikawa et al., AR-ION IMPACT DESORPTION OF AU AND AG FROM THE SI(111)-(2-ROOT-3X2-ROOT-3)-(AU,AG) SURFACE(), Surface science, 374(1-3), 1997, pp. 306-318
The change of Au and Ag coverages at the Si(111)-(2 root 3 x 2 root 3)
-(Au,Ag) surface by 5 keV Ar+-ion bombardment has been measured by mea
ns of AES and RES techniques in order to determine the potential barri
er heights for their desorption and recoil implantation. The cross-sec
tion for recoil implantation of Au is 2.5 times larger than that of Au
at the Si(111)-(root 3 x root 3)-Au surface, while that of Ag is smal
ler than that of Ag at the Si(111)-(root 3 x root 3)-Ag surface. The c
ross-section for desorption of Au is also larger than that at the Si(1
11)-(root 3 x root 3)-Au surface, and that of Ag is smaller than that
at the Si(111)-(root 3 x root 3)-Ag surface. It is concluded from the
recoil-implantation cross-section data that Ag atoms are located on th
e Au layer of the double-layer structure. From the analysis of these c
ross-sections, the potential barrier heights for recoil-implantation a
nd desorption are evaluated to be 4.2 +/- 0.4 and 4.2 +/- 0.8 eV for A
u and 0.33 +/- 0.17 and 3.6 +/- 0.7 eV for Ag. (C) 1997 Elsevier Scien
ce B.V.