The interaction of ethyl iodide with Ni(100) surfaces has been examine
d by using thermal programmed desorption (TPD), X-ray photoelectron (X
PS), and static secondary ion mass (SSIMS) spectroscopies. Ethyl iodid
e adsorbs molecularly on that surface below 100 K, and dissociates bet
ween 100 and 160 K to form ethyl species and iodine atoms. At low cove
rages the ethyl moieties decompose completely to form surface carbon a
nd hydrogen atoms (which recombine and desorb at slightly above 300 K)
, but desorption of both ethylene and ethane is also observed at highe
r coverages. Ethylene forms via the elimination of a hydrogen atom fro
m the beta position, and desorbs between 160 and 210 K depending on th
e initial coverage of ethyl iodide; ethane, on the other hand, is gene
rated mostly by a direct recombination of ethyl species with hydrogen
originating either from adsorption of background gases or from the bet
a-hydride elimination reaction.