M. Iyori et al., PROPERTY CONTROL FOR HIGH-QUALITY BA1-XKXBIO3 EPITAXIAL THIN-FILMS PREPARED BY HIGH-PRESSURE REACTIVE RF-MAGNETRON SPUTTERING, JPN J A P 1, 32(5A), 1993, pp. 1946-1951
The electrical properties of Ba1-xKxBiO3(BKBO) epitaxial thin films on
SrTiO3(110) substrates have been successfully controlled using high-p
ressure reactive rf-magnetron sputtering under an 80-Pa discharge gas.
We investigated the relationship between the target composition and t
he electrical properties of BKBO films. The zero resistance temperatur
e (T(ce)) and the temperature dependence of resistivity above the supe
rconducting onset temperature (T(co)) were found to be primarily influ
enced by the ratio of Ba/K and the Bi content of the target compositio
n, respectively. Electrical measurements showed that the highest Tce o
f as-grown BKBO epitaxial film was 28 K.