PROPERTY CONTROL FOR HIGH-QUALITY BA1-XKXBIO3 EPITAXIAL THIN-FILMS PREPARED BY HIGH-PRESSURE REACTIVE RF-MAGNETRON SPUTTERING

Citation
M. Iyori et al., PROPERTY CONTROL FOR HIGH-QUALITY BA1-XKXBIO3 EPITAXIAL THIN-FILMS PREPARED BY HIGH-PRESSURE REACTIVE RF-MAGNETRON SPUTTERING, JPN J A P 1, 32(5A), 1993, pp. 1946-1951
Citations number
25
Categorie Soggetti
Physics, Applied
Volume
32
Issue
5A
Year of publication
1993
Pages
1946 - 1951
Database
ISI
SICI code
Abstract
The electrical properties of Ba1-xKxBiO3(BKBO) epitaxial thin films on SrTiO3(110) substrates have been successfully controlled using high-p ressure reactive rf-magnetron sputtering under an 80-Pa discharge gas. We investigated the relationship between the target composition and t he electrical properties of BKBO films. The zero resistance temperatur e (T(ce)) and the temperature dependence of resistivity above the supe rconducting onset temperature (T(co)) were found to be primarily influ enced by the ratio of Ba/K and the Bi content of the target compositio n, respectively. Electrical measurements showed that the highest Tce o f as-grown BKBO epitaxial film was 28 K.